FT1 Platform
FLOW RATE RANGE : 10 ~ 20,000 Nm3/Hr.
Argon & Helium Purifier: H2O, O2, H2, CO, CO2, CH4 to <1 ppbv.
Nitrogen Purifier: H2O, O2, H2, CO, CO2, CH4 to <1 ppbv.
CO2 Purifier (w/ O2 removal): H2O < 1 ppbv, O2 < 1ppbv, Organics, Acids, Bases < 5 pptv,
Metals < 1 ppbv, Refractory Compounds to < 1 pptv
Enter the FABTRON® FT1, Rare Gas, Nitrogen and CO2 series, an
exceptional feat of engineering featuring a one-stage adsorption process
meticulously crafted to cater to the exacting purity standards of cutting-edge
facilities. This purification system achieves remarkable reductions in
impurities and bringing them down to below parts per trillion (ppt) at ambient temperatures.
The adsorber vessels in this series effortlessly transition between purification and regeneration modes, ensuring a continuous purification process that operates seamlessly within a single streamlined workflow. Regeneration of the adsorber is efficiently executed through precision backflushing with a meticulously calibrated mixture of purified gas and low-concentration hydrogen, meticulously conducted at 180 °C. (356 °F). This process ensures not only optimal performance but also extends the longevity of the system, solidifying its position as the pinnacle of gas purification technology.
FT2 Platform
Hydrogen Purifier: H2O, O2, CO, CO2, CH4 to <1 ppbv.
Enter the FABTRON® FT2, Hydrogen series, an
exceptional feat of engineering featuring a one-stage adsorption process
meticulously crafted to cater to the exacting purity standards of cutting-edge
facilities. This purification system achieves remarkable reductions in
impurities such as H2O, O2,
CO, CO2,
and CH4,
bringing them down to below parts per billion (ppb) at ambient temperatures.
The adsorber vessels in this series effortlessly transition between purification and regeneration modes, ensuring a continuous purification process that operates seamlessly within a single streamlined workflow. Regeneration of the adsorber is efficiently executed through precision backflushing with purified gas, meticulously conducted at 180 °C. (356 °F). This process ensures not only optimal performance but also extends the longevity of the system, solidifying its position as the pinnacle of gas purification technology.
FT3 Platform
Oxygen Purifier: H2O, CO, CO2 and CH4 to <1 ppbv.
CO2 Purifier (w/o O2 removal): H2O < 1 ppbv, Organics, Acids, Bases < 5 pptv, Metals < 1 ppbv,
Refractory Compounds < 1 pptv.
CDA Purifier (w/o CH4 removal): H2O < 1 ppbv, Organics, Acids, Bases < 5 pptv, Metals < 1 ppbv,
Refractory Compounds < 1 pptv.
Enter the FABTRON® FT3, Oxygen, CDA series, an
exceptional feat of engineering featuring a one-stage adsorption process
meticulously crafted to cater to the exacting purity standards of cutting-edge
facilities. This purification system achieves remarkable reductions in
impurities such as H2O,
CO, CO2,
H2,
and CH4,
bringing them down to below parts per billion (ppb) at ambient temperatures.
The adsorber vessels in this series effortlessly transition between purification and regeneration modes, ensuring a continuous purification process that operates seamlessly within a single streamlined workflow. Regeneration of the adsorber is efficiently executed through precision backflushing with purified Oxygen, meticulously conducted at 180 °C. (356 °F). This process ensures not only optimal performance but also extends the longevity of the system, solidifying its position as the pinnacle of gas purification technology.
FT4 Platform
Hazard Gas Purifier: Please consultant us for more possibilities.
FABTRON® FT4 series designed by single stage
adsorption, which is specially designed to provide electronic grade gas for
high-tech plants. Outlet impurities are reduced to below parts per billion (ppb) levels in
ambient temperature. The adsorber alternates between purification
and regeneration modes, providing continuous purification to remove impurities
in one single process. The regeneration of the adsorber is completed by back-flushing with a mixture of purified nitrogen and/or hydrogen at 180 Celsius and the purging
with REAL GAS to replace the regeneration nitrogen.
FT6 Platform, high CH4 inlet impurity
Oxygen Purifier: H2O, CO, CO2 and CH4 to <1 ppbv.
CDA Purifier: H2O < 1 ppbv, Organics, Acids, Bases < 5 pptv, Metals < 1 ppbv, Refractory Compounds < 1 pptv.
CDA Purifier: H2O < 1 ppbv, Organics, Acids, Bases < 5 pptv, Metals < 1 ppbv, Refractory Compounds < 1 pptv.
FABTRON® FT6 series designed by GFA
Catalyst vessel and Adsorbers for Nitrogen purification, which is specially
designed to remove H2O, O2, H2, CO, CO2, and
CH4 in Oxygen and Nitrogen to low parts per billion (ppb) levels.
The
catalyst vessel converts CH4, H2 and CO impurities to H2O
and CO2, at 180 ℃
(356 °F),
and then removed by a GHA adsorber at ambient temperature which installed down
stream of Catalyst vessel.
The adsorber vessels in this series effortlessly transition between purification and regeneration modes, ensuring a continuous purification process that operates seamlessly within a single streamlined workflow. Regeneration of the adsorber is efficiently executed through precision backflushing with a meticulously calibrated mixture of purified gas and low-concentration hydrogen, meticulously conducted at 180 °C. (356 °F). This process ensures not only optimal performance but also extends the longevity of the system, solidifying its position as the pinnacle of gas purification technology.
FT7 Platform
Hydrogen Gas Purifier: H2O, O2, CO, CO2, CH4 and N2 to <1 ppbv.
FABTRON® FT7 / H2
series is designed by two-stage absorption, which is specially designed to
provide electronic grade gas for high-tech plants. The impurities for H2O,
O2,
CO, CO2,
and
CH4
are reduced to below parts per billion (ppb) levels in
ambient temperature by a Granular Hollow Fiber. N2
impurity removed by heated getter column to below 1 ppb level which installed
downstream of the adsorber.
The adsorber vessels alternate between purification and regeneration modes, The adsorber regeneration is completed by back-flushing with purified hydrogen at 180 °C. (356 °F). A getter column was installed downstream of the Adsorber to provide continuous purification to remove N2 impurity at 300 °C. (572 °F). This process ensures not only optimal performance but also extends the longevity of the system, solidifying its position as the pinnacle of gas purification technology.
FT18 Platform
Gas Dryer: H2O removed to <1 ppbv.
Our advanced gas dryer system offers
unparalleled efficiency in reducing moisture levels to less than parts per
billion (ppb). It is meticulously designed to cater to a wide range of gases
including nitrogen (N2), argon, helium, oxygen (O2), hydrogen (H2), carbon
dioxide (CO2), and even air. Whether in industrial, laboratory, or specialized
applications, this system ensures optimal gas purity, enhancing performance and
reliability across diverse sectors.
The adsorber vessels in this series effortlessly transition between purification and regeneration modes, ensuring a continuous purification process that operates seamlessly within a single streamlined workflow. Regeneration of the adsorber is efficiently executed through precision backflushing with a meticulously calibrated mixture of purified gas and low-concentration hydrogen, meticulously conducted at 180 °C. (347 °F). This process ensures not only optimal performance but also extends the longevity of the system, solidifying its position as the pinnacle of gas purification technology.
FT21 Platform
FLOW RATE RANGE : 10 ~ 3,000 Nm3/Hr.
Argon, Helium and Nitrogen
Gas Purity increased from 3N grade to 9N Grade Purity.
The FABTRON® FT21 series represents an advanced Argon, Helium and Nitrogen purification system that seamlessly integrates Pressure Vacuum Swing Absorption (PVSA) and Molecular Adsorption technologies.
The FABTRON® FT21 series elevates Argon, Helium and Nitrogen purity from 3N grade (99.9%) to an impressive 9N grade (99.9999999%). This exceptional level of purity meets the stringent requirements of cutting-edge applications, including fuel cells, semiconductor manufacturing, and other high-tech industries.
In summary, the FABTRON® FT21 series stands as a pinnacle in Argon, Helium and Nitrogen purification technology, delivering ultra-pure Argon, Helium and Nitrogen gas for critical industrial processes.
FT22 Platform
FLOW RATE RANGE : 10 ~ 3,000 Nm3/Hr.
Hydrogen
Gas Purity increased from 3N grade to 9N Grade Purity.
The FABTRON® FT22 series represents an
advanced Hydrogen purification system that seamlessly integrates Pressure
Vacuum Swing Absorption (PVSA) and Molecular Adsorption technologies.
The FABTRON® FT22 series elevates Hydrogen purity from 3N grade (99.9%) to an impressive 9N grade (99.9999999%).
This exceptional level of purity meets the stringent requirements of
cutting-edge applications, including fuel cells, semiconductor manufacturing,
and other high-tech industries.
In summary, the FABTRON®
FT22 series stands as a pinnacle in Hydrogen purification technology,
delivering ultra-pure hydrogen gas for critical industrial processes.
FT23 Platform
FLOW RATE RANGE : 10 ~ 3,000 Nm3/Hr.
Oxygen
Gas Purity increased from 3N grade to 9N Grade Purity.
The FABTRON® FT23 series represents an
advanced hydrogen purification system that seamlessly integrates Pressure
Vacuum Swing Absorption (PVSA) and Molecular Adsorption technologies.
The FABTRON® FT23 series elevates Oxygen purity from 3N grade (99.9%) to an impressive 9N grade (99.9999999%).
This exceptional level of purity meets the stringent requirements of
cutting-edge applications, including fuel cells, semiconductor manufacturing,
and other high-tech industries.
In summary, the FABTRON® FT23 series stands as a pinnacle in Oxygen purification technology, delivering ultra-pure Oxygen gas for critical industrial processes.